| Melting Point: | 124.6 ºC |
|---|---|
| Boiling Point: | 240 ºC |
| Density: | 1.52 G/Cm³ |
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| Item | Standard |
| Content | 98% Min. |
| (NH4)2SiF6 | 0.7% Max. |
| SO42- | 0.1% Max. |
| Residue After Burning | 0.2% Max. |
| Loss On Drying | 3% Max. |
Mainly used as glass etching agents (together with fluohydric acid) in the production of etched glass. It is also used as a chemical agent, disinfection and antiseptic agent in fermentation industry, solvent in making beryllium from beryllia and the surface treating agent of silicon steel plate. Other application includes ceramic, magnesium alloy, the detergent in boiler feed water system and steam-generating system, acidizing of the sandstone in oil well, and catalyzer of alkylation isomerization.
1, Q: Can you supply samples for testing?
A: Yes, Our samples are free for your testing,
However, you need to afford the delivery fee (DHL/TNT/EMS)
The delivery fee will be deducted from the future bulk order.
2, Q: What documents you provide for every shipment?
A: Usually, Commercial invoice, Packing list, Bill of lading, COA, Certificate of origin,
MSDS are promised. Other documents you need for import,
please feel free to contact us.
3,Q: How can i get the price for this product?
A: Please give us the exact quantity,packing,destination port and
other necessary information,we will give you quotation according
to your specific requirments.
4,Q: How about delivery lead time?
A: Delivery lead time: About 7-10 days after payment confirmed.(Chinese holiday not included).
5,Q:How to start orders or make payments?
A: Proforma invoice will be sent first after confirmation of order, enclosed our bank information. Payment by T/T,Western Union or Paypal or secure payment.
It can be used in the photoresist production process of TFT-LCD photoresist diluent, photoresist removal liquid, stripping agent, IC cleaning agent, photoresist buffer, etching process and other chemical products requiring special specifications.
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